Opening remarks

• Sunao Ishihara(Representative of EUV-FEL Light Source Study Group for Industrialization)

Fundamental Research to Solve the EUV Technical Issues, and Future Prospect for EUVL toward Advanced Devices Fabrication

• Takeo Watanabe(Center for EUVL, Director, Laboratory of Advanced Science and Technology for Industry, Dean, University of Hyogo)

Compact Storage Ring FEL:  a kW-scale EUV lithography source

• Rod Loewen(Lyncean Technologies, Inc., (CTO))

Construction and commissioning of cERL IR-FEL toward realization of the EUV-FEL

• Norio Nakamura(KEK)

Industrial application of accelerator : Medical RI production

• Kentaro Harada(KEK)

Driving Moore’s Law through Process and Packaging Innovations

• Naoki Kitano(Intel K.K.)

EUV Lithography as key scaling enabler for logic and memory

• Geert Vandenberghe(IMEC)

High-NA EUV Lithography exposure tool for EUV roadmap extension

• Jan van Schoot et al.(ASML)

Closing address & photo-session

• Hiroshi Kawata(KEK)