Openning Remarks

• Prof. Sunao Ishihara (Representative of EUV-FEL Light Source Study Group for Industrialization)

Greeting

• Dr. Tetsuyuki Muramatsu (MEXT)

Target of the workshop

• Prof. Hiroshi Kawata (KEK (Secretary of the workshop))

The Future of Semiconductor Manufacturing: New Developments in Speed and Innovation.

• Dr. Kazunari Ishimaru (Rapidus Corporation)

The Last Light Source

• Dr. Erik R. Hosler (xLight, Inc.)

Overview of accelerator element development in KEK for realization of EUV-FEL

• Prof. Shinichiro Michizono (Accelerator Laboratory, KEK)

The importance of and methods for coherence reduction in accelerator based lithography systems

• Dr. Patrick P. Naulleau (EUV Tech Inc., Lawrence Berkeley National Laboratory )

The current status and difficulties in manufacturing multilayer mirrors for BEUV lithography

• Dr. Hisataka Takenaka (TOYAMA Co., Ltd.)

Plasma Dynamics and Future of LPP-EUV Source for Semiconductor Manufacturing

• Prof. Hakaru Mizoguchi et al. (Quantum and Photonics Technology Research Center, Kyushu University)

Closing address

• Koki Uchimaru (KEK, Executive Director)

Photo-session