Name: 4th EUV-FEL Workshop
Start: 2019-12-10T12:30:00+09:00
End: 2019-12-10T17:25:00+09:00
Location: Akihabara UDX

4th EUV-FEL Workshop

Tuesday, December 10, 2019 - 12:30 PM

Monday, December 9, 2019
Tuesday, December 10, 2019

1:10 PM 【Keynote】R&D on new lasers with unexplored wavelengths aiming at idustrial application/Tadatake Sato（AIST）
【Keynote】R&D on new lasers with unexplored wavelengths aiming at idustrial application/Tadatake Sato（AIST）
1:10 PM - 1:50 PM
Room: NEXT1

1:50 PM 【Keynote】Trend of Leading-Edge Semiconductors and the Patterning Technologies/Soichi Inoue（KIOXIA）
【Keynote】Trend of Leading-Edge Semiconductors and the Patterning Technologies/Soichi Inoue（KIOXIA）
1:50 PM - 2:30 PM
Room: NEXT1

2:30 PM Break
Break
2:30 PM - 3:00 PM
Room: NEXT1

3:00 PM Demonstration of high-repetition FEL using cERL and beyond EUV-FEL/Ryukou Kato（KEK）
Demonstration of high-repetition FEL using cERL and beyond EUV-FEL/Ryukou Kato（KEK）
3:00 PM - 3:30 PM
Room: NEXT1

3:30 PM Study on the soft X-ray FEL light irradiation of resist materials/Kazumasa Okamoto（Osaka Univ.）
Study on the soft X-ray FEL light irradiation of resist materials/Kazumasa Okamoto（Osaka Univ.）
3:30 PM - 4:00 PM
Room: NEXT1

4:00 PM Leading Edge Short Wavelength Light Source（DUV/EUV） for High Volume Semiconductor Manufacturing/Hakaru Mizoguchi（GIGAPHOTON INC.）
Leading Edge Short Wavelength Light Source（DUV/EUV） for High Volume Semiconductor Manufacturing/Hakaru Mizoguchi（GIGAPHOTON INC.）
4:00 PM - 4:30 PM
Room: NEXT1

4:30 PM Cost reduction of superconducting rf accelerator and next-generation technology/Shinichiro Michizono（KEK）
Cost reduction of superconducting rf accelerator and next-generation technology/Shinichiro Michizono（KEK）
4:30 PM - 5:00 PM
Room: NEXT1