Name: 5th EUV-FEL Workshop
Start: 2021-01-22T12:30:00+09:00
End: 2021-01-22T17:00:00+09:00
Location: KEK

5th EUV-FEL Workshop

Friday, 22 January 2021 - 12:30

Monday, 18 January 2021
Tuesday, 19 January 2021
Wednesday, 20 January 2021
Thursday, 21 January 2021
Friday, 22 January 2021
12:30 Opening remarks - Sunao Ishihara(Representative of EUV-FEL Light Source Study Group for Industrialization)
Opening remarks
- Sunao Ishihara(Representative of EUV-FEL Light Source Study Group for Industrialization)
12:30 - 12:40
12:40 Fundamental Research to Solve the EUV Technical Issues, and Future Prospect for EUVL toward Advanced Devices Fabrication - Takeo Watanabe(Center for EUVL, Director, Laboratory of Advanced Science and Technology for Industry, Dean, University of Hyogo)
Fundamental Research to Solve the EUV Technical Issues, and Future Prospect for EUVL toward Advanced Devices Fabrication
- Takeo Watanabe(Center for EUVL, Director, Laboratory of Advanced Science and Technology for Industry, Dean, University of Hyogo)
12:40 - 13:20
13:20 Compact Storage Ring FEL: a kW-scale EUV lithography source - Rod Loewen(Lyncean Technologies, Inc., (CTO))
Compact Storage Ring FEL: a kW-scale EUV lithography source
- Rod Loewen(Lyncean Technologies, Inc., (CTO))
13:20 - 13:50
13:50 Construction and commissioning of cERL IR-FEL toward realization of the EUV-FEL - Norio Nakamura(KEK)
Construction and commissioning of cERL IR-FEL toward realization of the EUV-FEL
- Norio Nakamura(KEK)
13:50 - 14:20
14:20 Industrial application of accelerator : Medical RI production - Kentaro Harada(KEK)
Industrial application of accelerator : Medical RI production
- Kentaro Harada(KEK)
14:20 - 14:50
14:50 Break
Break
14:50 - 15:20
15:20 Driving Moore’s Law through Process and Packaging Innovations - Naoki Kitano(Intel K.K.)
Driving Moore’s Law through Process and Packaging Innovations
- Naoki Kitano(Intel K.K.)
15:20 - 15:50
15:50 EUV Lithography as key scaling enabler for logic and memory - Geert Vandenberghe(IMEC)
EUV Lithography as key scaling enabler for logic and memory
- Geert Vandenberghe(IMEC)
15:50 - 16:20
16:20 High-NA EUV Lithography exposure tool for EUV roadmap extension - Jan van Schoot et al.(ASML)
High-NA EUV Lithography exposure tool for EUV roadmap extension
- Jan van Schoot et al.(ASML)
16:20 - 16:50
16:50 Closing address & photo-session - Hiroshi Kawata(KEK)
Closing address & photo-session
- Hiroshi Kawata(KEK)
16:50 - 17:00