Announcement of the 5th EUV-FEL Workshop
Utilizing IoT, AI and related technologies, information processing devices and systems are evolving towards an ultra-smart society. To this end, EUV exposure technology using a laser plasma (LPP) light source has just been introduced in the leading-edge semiconductor chip production.
At SPIE conference on Advanced Lithography 2020 held at San Jose, USA, in February this year, taking-off of volume manufacturing by EUV was celebrated with looking back on success. At the same time, "Stochastic Noise" has become a main issue for more finer pattern fabrication. In order to cope with "Stochastic Noise", we discussed that much bright light source like 1kW or more will be a key issue in addition to high NA exposure systems and high-quality resists. This time we would like to discuss on free electron laser (FEL) light from high-energy accelerators as a promising candidate for high-intensity light sources.
The workshop is planned to be held on 22 January, 2021 as an international online web-meeting using English as an official language. Prof. Takeo Watanabe (Hyogo University) will give a key note lecture on the trend of the future lithography. The Invited speakers are Rod Loewen (Lyncean Technologies, Inc.), Geert Vandenberghe (IMEC), Jan van Schoot (ASML), Naoki Kitano (Intel), Norio Nakamura (KEK), and Kentaro Harada (KEK).
We hope that many people will discuss on EUV ultra-high-power light sources for the future at the meeting.
Representative of EUV-FEL Light Source Industrialization Study Group for Industrialization
High Energy Accelerator Research Organization, Center for Applied Superconducting Accelerator (CASA)
This workshop is supported by funding based on "KEK Donation Programs".