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5th EUV-FEL Workshop

22 January 2021
KEK
Asia/Tokyo timezone

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Contribution List

9 out of 9 displayed
  1. 1. Opening remarks
    Sunao Ishihara(Representative of EUV-FEL Light Source Study Group for Industrialization)
    22/01/2021, 12:30
  2. 2. Fundamental Research to Solve the EUV Technical Issues, and Future Prospect for EUVL toward Advanced Devices Fabrication
    Takeo Watanabe(Center for EUVL, Director, Laboratory of Advanced Science and Technology for Industry, Dean, University of Hyogo)
    22/01/2021, 12:40
  3. 3. Compact Storage Ring FEL:  a kW-scale EUV lithography source
    Rod Loewen(Lyncean Technologies, Inc., (CTO))
    22/01/2021, 13:20
  4. 4. Construction and commissioning of cERL IR-FEL toward realization of the EUV-FEL
    Norio Nakamura(KEK)
    22/01/2021, 13:50
  5. 5. Industrial application of accelerator : Medical RI production
    Kentaro Harada(KEK)
    22/01/2021, 14:20
  6. 6. Driving Moore’s Law through Process and Packaging Innovations
    Naoki Kitano(Intel K.K.)
    22/01/2021, 15:20
  7. 7. EUV Lithography as key scaling enabler for logic and memory
    Geert Vandenberghe(IMEC)
    22/01/2021, 15:50
  8. 8. High-NA EUV Lithography exposure tool for EUV roadmap extension
    Jan van Schoot et al.(ASML)
    22/01/2021, 16:20
  9. 9. Closing address & photo-session
    Hiroshi Kawata(KEK)
    22/01/2021, 16:50