5th EUV-FEL Workshop

Contribution List

1. Opening remarks

Sunao Ishihara(Representative of EUV-FEL Light Source Study Group for Industrialization)

1/22/21, 12:30 PM

2. Fundamental Research to Solve the EUV Technical Issues, and Future Prospect for EUVL toward Advanced Devices Fabrication

Takeo Watanabe(Center for EUVL, Director, Laboratory of Advanced Science and Technology for Industry, Dean, University of Hyogo)

1/22/21, 12:40 PM

3. Compact Storage Ring FEL:  a kW-scale EUV lithography source

Rod Loewen(Lyncean Technologies, Inc., (CTO))

1/22/21, 1:20 PM

4. Construction and commissioning of cERL IR-FEL toward realization of the EUV-FEL

Norio Nakamura(KEK)

1/22/21, 1:50 PM

5. Industrial application of accelerator : Medical RI production

Kentaro Harada(KEK)

1/22/21, 2:20 PM

6. Driving Moore’s Law through Process and Packaging Innovations

Naoki Kitano(Intel K.K.)

1/22/21, 3:20 PM

7. EUV Lithography as key scaling enabler for logic and memory

Geert Vandenberghe(IMEC)

1/22/21, 3:50 PM

8. High-NA EUV Lithography exposure tool for EUV roadmap extension

Jan van Schoot et al.(ASML)

1/22/21, 4:20 PM

9. Closing address & photo-session

Hiroshi Kawata(KEK)

1/22/21, 4:50 PM