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6th EUV-FEL Workshop

→ Asia/Tokyo
Hiroshi KAWATA (KEK)
Description

Announcement of the 6th EUV-FEL Workshop

Utilizing IoT, AI and related technologies, information processing devices and systems are evolving towards an ultra-smart society. To this end, EUV exposure technology using a laser plasma (LPP) light source has been introduced in the leading-edge semiconductor chip production. 

At SPIE conference on Photomask Technology + EUV Lithography Digital Forum, which was held at the end of Sept. 2021, many topics were discussed for present and future EUV lithography technologies such as High NA EUV lithography exposure system. And the road map for fine patterning less than 3nm Node was clearly proposed.  To achieve such aggressive targets, the EUV light source power should be increased to keep the performance. The further development of the LPP light sources in ASML and Gigaphoton, and the proof of concept of EUV-FEL for much higher EUV-light source in KEK (https://semiengineering.com/manufacturing-bits-oct-5/) were presented in this conference.

The workshop is planned to be held at the afternoon on 18 January, 2022 as an international online web-meeting using English as an official language. Tetsuro Higashi (Chairman Emeritus of TEL, Former Chairman and Directors Emeritus of SEMI, Chairman, Executive Board of TIA) and Atsuyoshi Koike (President of Western Digital Japan) will give key note lectures about the present and future semi-conductor industries in an international perspective.  The invited speakers are; Zhilong Pan (Tsinghua University) and Norio Nakamura (KEK) for accelerator based high power light source, Hakaru Mizoguchi (Gigaphoton) for LPP light source, and Tsutomu Shoki (HOYA) for the latest development of EUV photomasks, respectively. 

We hope that many people will discuss on EUV ultra-high-power light sources for the future at the meeting.


Sunao Ishihara
Representative of EUV-FEL Light Source Industrialization Study Group for Industrialization 

Hiroshi Kawata
High Energy Accelerator Research Organization, Center for Applied  Superconducting Accelerator (CASA) 

This workshop is supported by funding based on "KEK Donation Programs".
 

6th_EUV-FEL_Poster.pdf
6th_EUV-FEL_Program.pdf
Photo_session.jpg
Contact
    • 1
      Opening remarks
      Speaker: Sunao Ishihara (Representative of EUV-FEL Light Source Study Group for Industrialization) (Representative of EUV-FEL Light Source Study Group for Industrialization)
    • 2
      key note lecture (1) Semiconductor Industries: Creating the opportunities for the bright future in Japan
      Speaker: Tetsuro Higashi (TEL, SEMI, and TIA) (TEL, SEMI, and TIA)
      Tetsuro Higashi.pdf
    • 3
      key note lecture (2) Future Semiconductor Manufacturing Technology for Ultra-Smart Society
      Speaker: Atsuyoshi Koike (Western Digital Japan) (Western Digital Japan)
      Atsuyoshi Koike.pdf
    • 4
      Invited speaker (1) The recent progress of SSMB EUV light source project at Tsinghua University
      Speaker: Zhilong Pan (Tsinghua University) (Tsinghua University)
      Zhilong Pan.pdf
    • 15:00
      Break
    • 5
      Invited speaker (2) Challenge of attenuated phase shift mask for EUV lithography
      Speaker: Tsutomu Shoki (HOYA) (HOYA)
      Tsutomu Shoki.pdf
    • 6
      Invited speaker (3) Progress of DUV・EUV Light Source and its Extension to Leading Edge Semiconductor Manufacturing
      Speaker: Hakaru Mizoguchi (Gigaphoton)
      Hakaru Mizoguchi.pdf
    • 7
      Invited speaker (4) Demonstration of Proof-of-Concept of EUV and Beyond EUV FELs for Future Lithography
      Speaker: Norio Nakamura (KEK) (KEK)
      Norio Nakamura.pdf
    • 8
      Closing address
      Speaker: Shin-ichi Adachi (KEK Executive Director)
    • 9
      Statistic & Photo-session
      Speaker: Hiroshi Kawata (KEK)
      final session_6th.pdf
      photo session_6th.jpg
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