Name: 6th EUV-FEL Workshop
Start: 2022-01-18T12:00:00+09:00
End: 2022-01-18T17:00:00+09:00
Location: No location set

6th EUV-FEL Workshop

Tuesday, 18 January 2022 - 12:00

Monday, 17 January 2022
Tuesday, 18 January 2022
13:00 Opening remarks - Sunao Ishihara (Representative of EUV-FEL Light Source Study Group for Industrialization) (Representative of EUV-FEL Light Source Study Group for Industrialization)
Opening remarks
- Sunao Ishihara (Representative of EUV-FEL Light Source Study Group for Industrialization) (Representative of EUV-FEL Light Source Study Group for Industrialization)
13:00 - 13:10
13:10 key note lecture (1) Semiconductor Industries: Creating the opportunities for the bright future in Japan - Tetsuro Higashi (TEL, SEMI, and TIA) (TEL, SEMI, and TIA)
key note lecture (1) Semiconductor Industries: Creating the opportunities for the bright future in Japan
- Tetsuro Higashi (TEL, SEMI, and TIA) (TEL, SEMI, and TIA)
13:10 - 13:50
13:50 key note lecture (2) Future Semiconductor Manufacturing Technology for Ultra-Smart Society - Atsuyoshi Koike (Western Digital Japan) (Western Digital Japan)
key note lecture (2) Future Semiconductor Manufacturing Technology for Ultra-Smart Society
- Atsuyoshi Koike (Western Digital Japan) (Western Digital Japan)
13:50 - 14:30
14:30 Invited speaker (1) The recent progress of SSMB EUV light source project at Tsinghua University - Zhilong Pan (Tsinghua University) (Tsinghua University)
Invited speaker (1) The recent progress of SSMB EUV light source project at Tsinghua University
- Zhilong Pan (Tsinghua University) (Tsinghua University)
14:30 - 15:00
15:00 Break
Break
15:00 - 15:20
15:20 Invited speaker (2) Challenge of attenuated phase shift mask for EUV lithography - Tsutomu Shoki (HOYA) (HOYA)
Invited speaker (2) Challenge of attenuated phase shift mask for EUV lithography
- Tsutomu Shoki (HOYA) (HOYA)
15:20 - 15:50
15:50 Invited speaker (3) Progress of DUV・EUV Light Source and its Extension to Leading Edge Semiconductor Manufacturing - Hakaru Mizoguchi (Gigaphoton)
Invited speaker (3) Progress of DUV・EUV Light Source and its Extension to Leading Edge Semiconductor Manufacturing
- Hakaru Mizoguchi (Gigaphoton)
15:50 - 16:20
16:20 Invited speaker (4) Demonstration of Proof-of-Concept of EUV and Beyond EUV FELs for Future Lithography - Norio Nakamura (KEK) (KEK)
Invited speaker (4) Demonstration of Proof-of-Concept of EUV and Beyond EUV FELs for Future Lithography
- Norio Nakamura (KEK) (KEK)
16:20 - 16:50
16:50 Closing address - Shin-ichi Adachi (KEK Executive Director)
Closing address
- Shin-ichi Adachi (KEK Executive Director)
16:50 - 16:55
16:55 Statistic & Photo-session - Hiroshi Kawata (KEK)
Statistic & Photo-session
- Hiroshi Kawata (KEK)
16:55 - 17:00