Name: 6th EUV-FEL Workshop
Start: 2022-01-18T12:00:00+09:00
End: 2022-01-18T17:00:00+09:00
Location: No location set

6th EUV-FEL Workshop

Tuesday, January 18, 2022 - 12:00 PM

Monday, January 17, 2022
Tuesday, January 18, 2022
1:00 PM Opening remarks - Sunao Ishihara (Representative of EUV-FEL Light Source Study Group for Industrialization) (Representative of EUV-FEL Light Source Study Group for Industrialization)
Opening remarks
- Sunao Ishihara (Representative of EUV-FEL Light Source Study Group for Industrialization) (Representative of EUV-FEL Light Source Study Group for Industrialization)
1:00 PM - 1:10 PM
1:10 PM key note lecture (1) Semiconductor Industries: Creating the opportunities for the bright future in Japan - Tetsuro Higashi (TEL, SEMI, and TIA) (TEL, SEMI, and TIA)
key note lecture (1) Semiconductor Industries: Creating the opportunities for the bright future in Japan
- Tetsuro Higashi (TEL, SEMI, and TIA) (TEL, SEMI, and TIA)
1:10 PM - 1:50 PM
1:50 PM key note lecture (2) Future Semiconductor Manufacturing Technology for Ultra-Smart Society - Atsuyoshi Koike (Western Digital Japan) (Western Digital Japan)
key note lecture (2) Future Semiconductor Manufacturing Technology for Ultra-Smart Society
- Atsuyoshi Koike (Western Digital Japan) (Western Digital Japan)
1:50 PM - 2:30 PM
2:30 PM Invited speaker (1) The recent progress of SSMB EUV light source project at Tsinghua University - Zhilong Pan (Tsinghua University) (Tsinghua University)
Invited speaker (1) The recent progress of SSMB EUV light source project at Tsinghua University
- Zhilong Pan (Tsinghua University) (Tsinghua University)
2:30 PM - 3:00 PM
3:00 PM Break
Break
3:00 PM - 3:20 PM
3:20 PM Invited speaker (2) Challenge of attenuated phase shift mask for EUV lithography - Tsutomu Shoki (HOYA) (HOYA)
Invited speaker (2) Challenge of attenuated phase shift mask for EUV lithography
- Tsutomu Shoki (HOYA) (HOYA)
3:20 PM - 3:50 PM
3:50 PM Invited speaker (3) Progress of DUV・EUV Light Source and its Extension to Leading Edge Semiconductor Manufacturing - Hakaru Mizoguchi (Gigaphoton)
Invited speaker (3) Progress of DUV・EUV Light Source and its Extension to Leading Edge Semiconductor Manufacturing
- Hakaru Mizoguchi (Gigaphoton)
3:50 PM - 4:20 PM
4:20 PM Invited speaker (4) Demonstration of Proof-of-Concept of EUV and Beyond EUV FELs for Future Lithography - Norio Nakamura (KEK) (KEK)
Invited speaker (4) Demonstration of Proof-of-Concept of EUV and Beyond EUV FELs for Future Lithography
- Norio Nakamura (KEK) (KEK)
4:20 PM - 4:50 PM
4:50 PM Closing address - Shin-ichi Adachi (KEK Executive Director)
Closing address
- Shin-ichi Adachi (KEK Executive Director)
4:50 PM - 4:55 PM
4:55 PM Statistic & Photo-session - Hiroshi Kawata (KEK)
Statistic & Photo-session
- Hiroshi Kawata (KEK)
4:55 PM - 5:00 PM