6th EUV-FEL Workshop

Tuesday 18 Jan 2022, 12:00 → 17:00 Asia/Tokyo

Hiroshi KAWATA (KEK)

Announcement of the 6th EUV-FEL Workshop

Utilizing IoT, AI and related technologies, information processing devices and systems are evolving towards an ultra-smart society. To this end, EUV exposure technology using a laser plasma (LPP) light source has been introduced in the leading-edge semiconductor chip production. 

At SPIE conference on Photomask Technology + EUV Lithography Digital Forum, which was held at the end of Sept. 2021, many topics were discussed for present and future EUV lithography technologies such as High NA EUV lithography exposure system. And the road map for fine patterning less than 3nm Node was clearly proposed.  To achieve such aggressive targets, the EUV light source power should be increased to keep the performance. The further development of the LPP light sources in ASML and Gigaphoton, and the proof of concept of EUV-FEL for much higher EUV-light source in KEK (https://semiengineering.com/manufacturing-bits-oct-5/) were presented in this conference.

The workshop is planned to be held at the afternoon on 18 January, 2022 as an international online web-meeting using English as an official language. Tetsuro Higashi (Chairman Emeritus of TEL, Former Chairman and Directors Emeritus of SEMI, Chairman, Executive Board of TIA) and Atsuyoshi Koike (President of Western Digital Japan) will give key note lectures about the present and future semi-conductor industries in an international perspective.  The invited speakers are; Zhilong Pan (Tsinghua University) and Norio Nakamura (KEK) for accelerator based high power light source, Hakaru Mizoguchi (Gigaphoton) for LPP light source, and Tsutomu Shoki (HOYA) for the latest development of EUV photomasks, respectively. 

We hope that many people will discuss on EUV ultra-high-power light sources for the future at the meeting.


Sunao Ishihara
Representative of EUV-FEL Light Source Industrialization Study Group for Industrialization 

Hiroshi Kawata
High Energy Accelerator Research Organization, Center for Applied  Superconducting Accelerator (CASA) 

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This workshop is supported by funding based on "KEK Donation Programs".
 

6th_EUV-FEL_Poster.pdf

6th_EUV-FEL_Program.pdf

Photo_session.jpg

13:00 → 13:10 Opening remarks

Speaker: Sunao Ishihara (Representative of EUV-FEL Light Source Study Group for Industrialization) (Representative of EUV-FEL Light Source Study Group for Industrialization)

13:10 → 13:50 key note lecture (1) Semiconductor Industries: Creating the opportunities for the bright future in Japan

Speaker: Tetsuro Higashi (TEL, SEMI, and TIA) (TEL, SEMI, and TIA)

Tetsuro Higashi.pdf

13:50 → 14:30 key note lecture (2) Future Semiconductor Manufacturing Technology for Ultra-Smart Society

Speaker: Atsuyoshi Koike (Western Digital Japan) (Western Digital Japan)

Atsuyoshi Koike.pdf

14:30 → 15:00 Invited speaker (1) The recent progress of SSMB EUV light source project at Tsinghua University

Speaker: Zhilong Pan (Tsinghua University) (Tsinghua University)

Zhilong Pan.pdf

15:00 → 15:20 Break

15:20 → 15:50 Invited speaker (2) Challenge of attenuated phase shift mask for EUV lithography

Speaker: Tsutomu Shoki (HOYA) (HOYA)

Tsutomu Shoki.pdf

15:50 → 16:20 Invited speaker (3) Progress of DUV・EUV Light Source and its Extension to Leading Edge Semiconductor Manufacturing

Speaker: Hakaru Mizoguchi (Gigaphoton)

Hakaru Mizoguchi.pdf

16:20 → 16:50 Invited speaker (4) Demonstration of Proof-of-Concept of EUV and Beyond EUV FELs for Future Lithography

Speaker: Norio Nakamura (KEK) (KEK)

Norio Nakamura.pdf

16:50 → 16:55 Closing address

Speaker: Shin-ichi Adachi (KEK Executive Director)

16:55 → 17:00 Statistic & Photo-session

Speaker: Hiroshi Kawata (KEK)

final session_6th.pdf

photo session_6th.jpg