4th EUV-FEL Workshop

Tuesday, 10 December 2019 - 12:30
Akihabara UDX (NEXT1)

        : Sessions
    /     : Talks
        : Breaks
10 Dec 2019
AM
PM
13:10 【Keynote】R&D on new lasers with unexplored wavelengths aiming at idustrial application/Tadatake Sato(AIST)   (NEXT1)
Slides
13:50 【Keynote】Trend of Leading-Edge Semiconductors and the Patterning Technologies/Soichi Inoue(KIOXIA)   (NEXT1)
Slides
14:30 --- Break ---
15:00 Demonstration of high-repetition FEL using cERL and beyond EUV-FEL/Ryukou Kato(KEK)   (NEXT1)
Slides
15:30 Study on the soft X-ray FEL light irradiation of resist materials/Kazumasa Okamoto(Osaka Univ.)   (NEXT1)
Slides
16:00 Leading Edge Short Wavelength Light Source(DUV/EUV) for High Volume Semiconductor Manufacturing/Hakaru Mizoguchi(GIGAPHOTON INC.)   (NEXT1)
Slides
16:30 Cost reduction of superconducting rf accelerator and next-generation technology/Shinichiro Michizono(KEK)   (NEXT1)
Slides