6th EUV-FEL Workshop
Tuesday, 18 January 2022 -
12:00
Monday, 17 January 2022
Tuesday, 18 January 2022
13:00
Opening remarks
-
Sunao Ishihara (Representative of EUV-FEL Light Source Study Group for Industrialization)
(
Representative of EUV-FEL Light Source Study Group for Industrialization
)
Opening remarks
Sunao Ishihara (Representative of EUV-FEL Light Source Study Group for Industrialization)
(
Representative of EUV-FEL Light Source Study Group for Industrialization
)
13:00 - 13:10
13:10
key note lecture (1) Semiconductor Industries: Creating the opportunities for the bright future in Japan
-
Tetsuro Higashi (TEL, SEMI, and TIA)
(
TEL, SEMI, and TIA
)
key note lecture (1) Semiconductor Industries: Creating the opportunities for the bright future in Japan
Tetsuro Higashi (TEL, SEMI, and TIA)
(
TEL, SEMI, and TIA
)
13:10 - 13:50
13:50
key note lecture (2) Future Semiconductor Manufacturing Technology for Ultra-Smart Society
-
Atsuyoshi Koike (Western Digital Japan)
(
Western Digital Japan
)
key note lecture (2) Future Semiconductor Manufacturing Technology for Ultra-Smart Society
Atsuyoshi Koike (Western Digital Japan)
(
Western Digital Japan
)
13:50 - 14:30
14:30
Invited speaker (1) The recent progress of SSMB EUV light source project at Tsinghua University
-
Zhilong Pan (Tsinghua University)
(
Tsinghua University
)
Invited speaker (1) The recent progress of SSMB EUV light source project at Tsinghua University
Zhilong Pan (Tsinghua University)
(
Tsinghua University
)
14:30 - 15:00
15:00
Break
Break
15:00 - 15:20
15:20
Invited speaker (2) Challenge of attenuated phase shift mask for EUV lithography
-
Tsutomu Shoki (HOYA)
(
HOYA
)
Invited speaker (2) Challenge of attenuated phase shift mask for EUV lithography
Tsutomu Shoki (HOYA)
(
HOYA
)
15:20 - 15:50
15:50
Invited speaker (3) Progress of DUV・EUV Light Source and its Extension to Leading Edge Semiconductor Manufacturing
-
Hakaru Mizoguchi (Gigaphoton)
Invited speaker (3) Progress of DUV・EUV Light Source and its Extension to Leading Edge Semiconductor Manufacturing
Hakaru Mizoguchi (Gigaphoton)
15:50 - 16:20
16:20
Invited speaker (4) Demonstration of Proof-of-Concept of EUV and Beyond EUV FELs for Future Lithography
-
Norio Nakamura (KEK)
(
KEK
)
Invited speaker (4) Demonstration of Proof-of-Concept of EUV and Beyond EUV FELs for Future Lithography
Norio Nakamura (KEK)
(
KEK
)
16:20 - 16:50
16:50
Closing address
-
Shin-ichi Adachi (KEK Executive Director)
Closing address
Shin-ichi Adachi (KEK Executive Director)
16:50 - 16:55
16:55
Statistic & Photo-session
-
Hiroshi Kawata (KEK)
Statistic & Photo-session
Hiroshi Kawata (KEK)
16:55 - 17:00