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9th EUV-FEL Workshop

4 February 2025
Tokyo Tech Front (Kuramae Kaikan), Institute of Science Tokyo
Asia/Tokyo timezone
Deadlines of ONSITE and ONLINE registration will be closed in January 28th and 31st respectively!

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Contribution List

9 out of 9 displayed
  1. 1. Openning Remarks
    Prof. Shinichiro Michizono (KEK, Executive Director)
    04/02/2025, 13:00
  2. 2. Greeting
    Dr. Tetsuyuki Muramatsu (MEXT)
    04/02/2025, 13:10
  3. 3. Target of the workshop
    Prof. Hiroshi Kawata (KEK_Secretary of the workshop)
    04/02/2025, 13:15
  4. 4. [Key-note Lecture] EUV Lithography: Current Research and Perspective
    Dr. Bruno La Fontaine (Director, The Center for X-ray Optics (CXRO) , LBNL)
    04/02/2025, 13:25

    With high-NA EUV Lithography entering its industrial R&D phase at various pilot lines this year, there are still a number of significant technical and scientific challenges to be addressed to ensure its success in manufacturing. I will describe some of these challenges, such as the tradeoffs between sensitivity, resolution and LER for patterning materials, as well as that of the mask 3D...

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  5. 5. R&D Status on Two-mirror In-Line Projector for OIST EUV lithography
    Prof. Tsumoru Shintake (OIST)
    04/02/2025, 14:25

    At OIST, we have started R&D on a highly energy-efficient two-mirror in-line projector with a simplified illumination system. The EUV source power can be reduced by 1/10 compared to the current six mirror EUV projector system. The required EUV power is 20 watts for a process speed of more than 100 wafers per hour. The proposed projector achieves 0.3 NA (13 mm field) and can be mounted in a...

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  6. 6. The Must Light Source
    Prof. Yosuke Honda (Accelerator Laboratory, KEK)
    04/02/2025, 14:55

    Energy-Recovery Linac (ERL) based Free-Electron Laser (FEL) has been a promising solution for the high-power EUV light source for future semiconductor lithography. Considering the increasing demands of semiconductors and the roadmap for smaller nodes, realization of a higher power EUV (and BEUV) light source at high efficiency has been strongly required. At KEK, we have been designing...

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  7. 7. Development of EUV / DUV Source for Semiconductor Manufacturing and its Application
    Prof. Hakaru Mizoguchi (QPTRC, Kyushu University)
    04/02/2025, 15:45

    In this conference, we will report about new EUV research activities in Kyushu-Univ. in Japan.
    1st topic is new EUV exposure research center: named “EUV Photon Co.. This organization will support material development of material industry of EUV lithography, for example photo-resist, and photo mask and so on. We prepare EUV light source and exposure optical system and vacuum chamber system for...

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  8. 8. Closing address
    Prof. Sunao Ishihara (Representative of EUV-FEL Light Source Study Group for Industrialization)
    04/02/2025, 16:15
  9. 9. Photo-session
    - -
    04/02/2025, 16:20