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10th EUV-FEL Workshop

January 28, 2026
Akihabara UDX Gallery Next
Asia/Tokyo timezone
Deadlines of ONSITE and ONLINE registration will be closed in January 16th and 26th respectively!

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Contribution List

11 out of 11 displayed
  1. 1. Openning Remarks
    Sunao Ishihara (Representative of EUV-FEL Light Source Study Group for Industrialization) 13:10-13:20
    1/28/26, 1:10 PM
  2. 2. Greeting
    Akira Henda (MEXT)
    1/28/26, 1:20 PM
  3. 3. Target of the workshop
    Hiroshi Kawata (Secretary of the workshop, KEK)
    1/28/26, 1:25 PM
  4. 4. 【Key-note Lecture】Development of Next-Generation Semiconductor Process Technologies for EUV and BEUV under Japan’s “K Program” by JST
    Junji Yumoto (The University of Tokyo)
    1/28/26, 1:35 PM
  5. 12. 【Key-note Lecture】Reviving Moore’s Law with an EUV FEL
    Nicholas Kelez (xLight Inc. , CEO & CTO)
    1/28/26, 2:15 PM
  6. 6. 【Invited Talk】The Vast Light Source
    Yosuke Honda (Accelerator Laboratory, KEK)
    1/28/26, 3:25 PM
  7. 7. 【Invited Talk】Development of Multilayer Mirrors for BEUV Reflective Optics -Current Status of an Ongoing Project-
    Takeo Ejima (Tohoku University)
    1/28/26, 4:05 PM
  8. 8. Closing address
    Shoji Asai (Director General, KEK)
    1/28/26, 4:45 PM
  9. 9. Photo-session
    1/28/26, 4:50 PM
  10. 11. 【Key-note Lecture】Reviving Moore’s Law with an EUV FEL
    Nicholas Kelez (xLight Inc. , CEO & CTO)
  11. 10. 【Key-note Lecture】TBA
    Nicholas Kelez (xLight Inc. , CEO & CTO)