Login

10th EUV-FEL Workshop

28 January 2026
Akihabara UDX Gallery Next
Asia/Tokyo timezone
Deadlines of ONSITE and ONLINE registration will be closed in January 16th and 26th respectively!

Contact

Contribution List

11 out of 11 displayed
  1. 1. Openning Remarks
    Sunao Ishihara (Representative of EUV-FEL Light Source Study Group for Industrialization) 13:10-13:20
    28/01/2026, 13:10
  2. 2. Greeting
    Akira Henda (MEXT)
    28/01/2026, 13:20
  3. 3. Target of the workshop
    Hiroshi Kawata (Secretary of the workshop, KEK)
    28/01/2026, 13:25
  4. 4. 【Key-note Lecture】Development of Next-Generation Semiconductor Process Technologies for EUV and BEUV under Japan’s “K Program” by JST
    Junji Yumoto (The University of Tokyo)
    28/01/2026, 13:35
  5. 12. 【Key-note Lecture】Reviving Moore’s Law with an EUV FEL
    Nicholas Kelez (xLight Inc. , CEO & CTO)
    28/01/2026, 14:15
  6. 6. 【Invited Talk】The Vast Light Source
    Yosuke Honda (Accelerator Laboratory, KEK)
    28/01/2026, 15:25
  7. 7. 【Invited Talk】Development of Multilayer Mirrors for BEUV Reflective Optics -Current Status of an Ongoing Project-
    Takeo Ejima (Tohoku University)
    28/01/2026, 16:05
  8. 8. Closing address
    Shoji Asai (Director General, KEK)
    28/01/2026, 16:45
  9. 9. Photo-session
    28/01/2026, 16:50
  10. 11. 【Key-note Lecture】Reviving Moore’s Law with an EUV FEL
    Nicholas Kelez (xLight Inc. , CEO & CTO)
  11. 10. 【Key-note Lecture】TBA
    Nicholas Kelez (xLight Inc. , CEO & CTO)