10th EUV-FEL Workshop

Contribution List

1. Openning Remarks

Sunao Ishihara (Representative of EUV-FEL Light Source Study Group for Industrialization) 13:10-13:20

1/28/26, 1:10 PM

2. Greeting

Akira Henda (MEXT)

1/28/26, 1:20 PM

3. Target of the workshop

Hiroshi Kawata (Secretary of the workshop, KEK)

1/28/26, 1:25 PM

4. 【Key-note Lecture】Development of Next-Generation Semiconductor Process Technologies for EUV and BEUV under Japan’s “K Program” by JST

Junji Yumoto (The University of Tokyo)

1/28/26, 1:35 PM

12. 【Key-note Lecture】Reviving Moore’s Law with an EUV FEL

Nicholas Kelez (xLight Inc. , CEO & CTO)

1/28/26, 2:15 PM

6. 【Invited Talk】The Vast Light Source

Yosuke Honda (Accelerator Laboratory, KEK)

1/28/26, 3:25 PM

7. 【Invited Talk】Development of Multilayer Mirrors for BEUV Reflective Optics -Current Status of an Ongoing Project-

Takeo Ejima (Tohoku University)

1/28/26, 4:05 PM

8. Closing address

Shoji Asai (Director General, KEK)

1/28/26, 4:45 PM

9. Photo-session

1/28/26, 4:50 PM

11. 【Key-note Lecture】Reviving Moore’s Law with an EUV FEL

Nicholas Kelez (xLight Inc. , CEO & CTO)

10. 【Key-note Lecture】TBA

Nicholas Kelez (xLight Inc. , CEO & CTO)