10th EUV-FEL Workshop

Wednesday 28 Jan 2026, 13:10 → 19:50 Asia/Tokyo

Conference NEXT1 (Akihabara UDX Gallery Next)

Hiroshi KAWATA (KEK)

We are pleased to announce that the 10th EUV-FEL Workshop will be held at the Akihabara UDX Gallery Next / Conference NEXT1 on January 28th, 2026.
 

In the recent development of cutting-edge semiconductors, high-NA EUV exposure systems have been in operation globally. Domestically, the development project for "next-generation semiconductor microfabrication process technology" under the government-led "Key and advanced technology R&D through cross community collaboration program" has been advancing since April 2025. Among these projects, is the EUV-FEL fundamental technology development project, which KEK has been studying for many years, was selected and its development research is progressing steadily.

 

At this workshop, Professor Junji Yumoto, the program director, will deliver a keynote speech outlining the overall picture of the program and expectations for EUV-FEL. In addition, Dr. Nicholas Kelez, CEO and CTO of xLight, a US company that advancing efforts like KEK's to manufacture FEL light sources using accelerator technology, will also deliver another keynote speech about their progress. We are in the process of finalizing the workshop program and inviting speakers. Details will be announced later, so please stay tuned. Currently, we are providing preliminary information regarding the date and venue, and we kindly ask you to mark your calendars. Furthermore, given that specific development projects have now commenced, we plan to hold a networking reception at the venue immediately following the Workshop. 

 

We look forward to your participation! 

 

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Workshop date and time: Wednesday, January 28th, 2026, 13:00-17:00 JST

Workshop site: Akihabara UDX Gallery Next / Conference NEXT1

Platform: Onsite and Zoom

Participation capacity: onsite 100 attendees, online 300 attendees

Participation fee: Free

 

Networking event date and time: Wednesday, January 28th, 2026, 17:30 - 19:30 JST

Networking site: Akihabara UDX Gallery Next / Conference NEXT2

Reception fee: 5,000 JPY (Payable in cash on-site)

*Cancellation will not be accepted after January 15th*

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Sunao Ishihara


Representative of EUV-FEL Light Source Study Group for Industrialization  

 

Hiroshi Kawata


High Energy Accelerator Research Organization, Innovation Center for Applied Superconducting Accelerator (iCASA)

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Poster_10th EUV-FEL Workshop.pdf

1 Openning Remarks

Speaker: Sunao Ishihara (Representative of EUV-FEL Light Source Study Group for Industrialization) 13:10-13:20

2 Greeting

Speaker: Akira Henda (MEXT)

3 Target of the workshop

Speaker: Hiroshi Kawata (Secretary of the workshop, KEK)

Target of the workshop_10th.pdf

4 【Key-note Lecture】Development of Next-Generation Semiconductor Process Technologies for EUV and BEUV under Japan’s “K Program” by JST

Speaker: Junji Yumoto (The University of Tokyo)

Junji Yumoto.pdf

5 【Key-note Lecture】Reviving Moore’s Law with an EUV FEL

Speaker: Nicholas Kelez (xLight Inc. , CEO & CTO)

Nicholas Kelez.pdf

14:55 Break

6 【Invited Talk】The Vast Light Source

Speaker: Yosuke Honda (Accelerator Laboratory, KEK)

Yosuke Honda.pdf

7 【Invited Talk】Development of Multilayer Mirrors for BEUV Reflective Optics -Current Status of an Ongoing Project-

Speaker: Takeo Ejima (Tohoku University)

Takeo Ejima.pdf

8 Closing address

Speaker: Shoji Asai (Director General, KEK)

Shoji Asai.pdf

9 Photo-session

17:30 Networking event