22 January 2021
KEK
Asia/Tokyo timezone

Workshop materials

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12:00
13:00
14:00
15:00
16:00
17:00
Sunao Ishihara(Representative of EUV-FEL Light Source Study Group for Industrialization)
Opening remarks
KEK
12:30 - 12:40
Takeo Watanabe(Center for EUVL, Director, Laboratory of Advanced Science and Technology for Industry, Dean, University of Hyogo)
Fundamental Research to Solve the EUV Technical Issues, and Future Prospect for EUVL toward Advanced Devices Fabrication
KEK
12:40 - 13:20
Rod Loewen(Lyncean Technologies, Inc., (CTO))
Compact Storage Ring FEL:  a kW-scale EUV lithography source
KEK
13:20 - 13:50
Norio Nakamura(KEK)
Construction and commissioning of cERL IR-FEL toward realization of the EUV-FEL
KEK
13:50 - 14:20
Kentaro Harada(KEK)
Industrial application of accelerator : Medical RI production
KEK
14:20 - 14:50
Break
KEK
14:50 - 15:20
Naoki Kitano(Intel K.K.)
Driving Moore’s Law through Process and Packaging Innovations
KEK
15:20 - 15:50
Geert Vandenberghe(IMEC)
EUV Lithography as key scaling enabler for logic and memory
KEK
15:50 - 16:20
Jan van Schoot et al.(ASML)
High-NA EUV Lithography exposure tool for EUV roadmap extension
KEK
16:20 - 16:50
Hiroshi Kawata(KEK)
Closing address & photo-session
KEK
16:50 - 17:00