5th EUV-FEL Workshop

Friday, 22 January 2021 - 12:30
KEK

        : Sessions
    /     : Talks
        : Breaks
22 Jan 2021
AM
PM
12:30 Opening remarks - Sunao Ishihara(Representative of EUV-FEL Light Source Study Group for Industrialization)   ()
12:40 Fundamental Research to Solve the EUV Technical Issues, and Future Prospect for EUVL toward Advanced Devices Fabrication - Takeo Watanabe(Center for EUVL, Director, Laboratory of Advanced Science and Technology for Industry, Dean, University of Hyogo)   ()
13:20 Compact Storage Ring FEL:  a kW-scale EUV lithography source - Rod Loewen(Lyncean Technologies, Inc., (CTO))   ()
13:50 Construction and commissioning of cERL IR-FEL toward realization of the EUV-FEL - Norio Nakamura(KEK)   ()
14:20 Industrial application of accelerator : Medical RI production - Kentaro Harada(KEK)   ()
14:50 --- Break ---
15:20 Driving Moore’s Law through Process and Packaging Innovations - Naoki Kitano(Intel K.K.)   ()
15:50 EUV Lithography as key scaling enabler for logic and memory - Geert Vandenberghe(IMEC)   ()
16:20 High-NA EUV Lithography exposure tool for EUV roadmap extension - Jan van Schoot et al.(ASML)   ()
16:50 Closing address - TBA   ()