In the field of cutting-edge semiconductor development, the trial operation of High-NA EUV lithography systems has begun globally. In Japan, financial support for mass production of next-generation semiconductors is expanding, and efforts are being made to foster advanced and critical technologies. From the perspective of sustainability, the demand for energy efficiency is also becoming increasingly urgent. In light of these trends, we organize the workshop and invite prominent speakers leading these fields.
Dr. Bruno La Fontaine, Director of the Center for X-ray Optics (CXRO) of LBNL, will deliver a keynote lecture about the Advanced EUV Lithography in a future including the subject of what kinds of challenges are important in the optics in the case of FEL light source lithography. Additionally, we are honored to feature distinguished invited speakers, including Prof. Tsumoru Shintake from Okinawa Institute of Science and Technology, Prof. Yosuke Honda from Accelerator Laboratory KEK, and Prof. Hakaru Mizoguchi from Quantum and Photonics Technology Research Center, Kyushu University.
Date and time: Tuesday, February 4, 2025, 13:00-16:25 (JST)
Workshop Site: Royal Blue Hall in Kuramae Kaikan, Institute of Science Tokyo
https://www.isct.ac.jp/en/001/about/campuses-and-offices/ookayama
Hybrid platform: Zoom
Participation capacity: ONSITE: ~100, ONLINE: 300
Participation fee: Free
We look forward to your participation!
Sunao Ishihara
Representative of EUV-FEL Light Source Study Group for Industrialization
Hiroshi Kawata
High Energy Accelerator Research Organization, Innovation Center for Applied Superconducting Accelerator (iCASA)
This workshop is supported by funding based on "KEK Donation Programs".
Registration
Registration for this event is currently open.
