6th EUV-FEL Workshop

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• Tue 18/01

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13:00

14:00

15:00

16:00

17:00

Sunao Ishihara (Representative of EUV-FEL Light Source Study Group for Industrialization)

Opening remarks

13:00 - 13:10

Tetsuro Higashi (TEL, SEMI, and TIA)

key note lecture (1) Semiconductor Industries: Creating the opportunities for the bright future in Japan

13:10 - 13:50

Atsuyoshi Koike (Western Digital Japan)

key note lecture (2) Future Semiconductor Manufacturing Technology for Ultra-Smart Society

13:50 - 14:30

Zhilong Pan (Tsinghua University)

Invited speaker (1) The recent progress of SSMB EUV light source project at Tsinghua University

14:30 - 15:00

Break

15:00 - 15:20

Tsutomu Shoki (HOYA)

Invited speaker (2) Challenge of attenuated phase shift mask for EUV lithography

15:20 - 15:50

Hakaru Mizoguchi (Gigaphoton)

Invited speaker (3) Progress of DUV・EUV Light Source and its Extension to Leading Edge Semiconductor Manufacturing

15:50 - 16:20

Norio Nakamura (KEK)

Invited speaker (4) Demonstration of Proof-of-Concept of EUV and Beyond EUV FELs for Future Lithography

16:20 - 16:50

Shin-ichi Adachi (KEK Executive Director)

Closing address

16:50 - 16:55

Hiroshi Kawata (KEK)

Statistic & Photo-session

16:55 - 17:00

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