6th EUV-FEL Workshop

Contribution List

1. Opening remarks

Sunao Ishihara (Representative of EUV-FEL Light Source Study Group for Industrialization) (Representative of EUV-FEL Light Source Study Group for Industrialization)

1/18/22, 1:00 PM

2. key note lecture (1) Semiconductor Industries: Creating the opportunities for the bright future in Japan

Tetsuro Higashi (TEL, SEMI, and TIA) (TEL, SEMI, and TIA)

1/18/22, 1:10 PM

3. key note lecture (2) Future Semiconductor Manufacturing Technology for Ultra-Smart Society

Atsuyoshi Koike (Western Digital Japan) (Western Digital Japan)

1/18/22, 1:50 PM

4. Invited speaker (1) The recent progress of SSMB EUV light source project at Tsinghua University

Zhilong Pan (Tsinghua University) (Tsinghua University)

1/18/22, 2:30 PM

5. Invited speaker (2) Challenge of attenuated phase shift mask for EUV lithography

Tsutomu Shoki (HOYA) (HOYA)

1/18/22, 3:20 PM

6. Invited speaker (3) Progress of DUV・EUV Light Source and its Extension to Leading Edge Semiconductor Manufacturing

Hakaru Mizoguchi (Gigaphoton)

1/18/22, 3:50 PM

7. Invited speaker (4) Demonstration of Proof-of-Concept of EUV and Beyond EUV FELs for Future Lithography

Norio Nakamura (KEK) (KEK)

1/18/22, 4:20 PM

8. Closing address

Shin-ichi Adachi (KEK Executive Director)

1/18/22, 4:50 PM

9. Statistic & Photo-session

Hiroshi Kawata (KEK)

1/18/22, 4:55 PM