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6th EUV-FEL Workshop

January 18, 2022
Asia/Tokyo timezone

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Contribution List

9 out of 9 displayed
  1. 1. Opening remarks
    Sunao Ishihara (Representative of EUV-FEL Light Source Study Group for Industrialization) (Representative of EUV-FEL Light Source Study Group for Industrialization)
    1/18/22, 1:00 PM
  2. 2. key note lecture (1) Semiconductor Industries: Creating the opportunities for the bright future in Japan
    Tetsuro Higashi (TEL, SEMI, and TIA) (TEL, SEMI, and TIA)
    1/18/22, 1:10 PM
  3. 3. key note lecture (2) Future Semiconductor Manufacturing Technology for Ultra-Smart Society
    Atsuyoshi Koike (Western Digital Japan) (Western Digital Japan)
    1/18/22, 1:50 PM
  4. 4. Invited speaker (1) The recent progress of SSMB EUV light source project at Tsinghua University
    Zhilong Pan (Tsinghua University) (Tsinghua University)
    1/18/22, 2:30 PM
  5. 5. Invited speaker (2) Challenge of attenuated phase shift mask for EUV lithography
    Tsutomu Shoki (HOYA) (HOYA)
    1/18/22, 3:20 PM
  6. 6. Invited speaker (3) Progress of DUV・EUV Light Source and its Extension to Leading Edge Semiconductor Manufacturing
    Hakaru Mizoguchi (Gigaphoton)
    1/18/22, 3:50 PM
  7. 7. Invited speaker (4) Demonstration of Proof-of-Concept of EUV and Beyond EUV FELs for Future Lithography
    Norio Nakamura (KEK) (KEK)
    1/18/22, 4:20 PM
  8. 8. Closing address
    Shin-ichi Adachi (KEK Executive Director)
    1/18/22, 4:50 PM
  9. 9. Statistic & Photo-session
    Hiroshi Kawata (KEK)
    1/18/22, 4:55 PM