6th EUV-FEL Workshop

Tuesday, 18 January 2022 - 12:00


        : Sessions
    /     : Talks
        : Breaks
18 Jan 2022
AM
PM
13:00 Opening remarks - Sunao Ishihara (Representative of EUV-FEL Light Source Study Group for Industrialization) (Representative of EUV-FEL Light Source Study Group for Industrialization)   ()
13:10 key note lecture (1) Semiconductor Industries: Creating the opportunities for the bright future in Japan - Teturo Higashi (TEL, SEMI, and TIA) (TEL, SEMI, and TIA)   ()
13:50 key note lecture (2) Future Semiconductor Manufacturing Technology for Ultra-Smart Society - Atsuyoshi Koike (Western Digital Japan) (Western Digital Japan)   ()
14:30 Invited speaker (1) The recent progress of SSMB EUV light source project at Tsinghua University - Zhilong Pan (Tsinghua University) (Tsinghua University)   ()
15:00 --- Break ---
15:20 Invited speaker (2) Demonstration of Proof-of-Concept of EUV and Beyond EUV FELs for Future Lithography - Norio Nakamura (KEK) (KEK)   ()
15:50 Invited speaker (3) Progress of DUV・EUV Light Source and its Extension to Leading Edge Semiconductor Manufacturing - Hakaru Mizoguchi (Gigaphoton)   ()
16:20 Invited speaker (4) Challenge of attenuated phase shift mask for EUV lithography - Tsutomu Shoki (HOYA)   ()
16:50 Closing address & Photo-session - Shin-ichi Adachi (KEK Executive Director)   ()