Name: 8th EUV-FEL Workshop
Start: 2024-01-29T13:00:00+09:00
End: 2024-01-29T17:00:00+09:00
Location: No location set

8th EUV-FEL Workshop

Monday, 29 January 2024 - 13:00

Monday, 29 January 2024
13:00 Openning Remarks - Prof. Sunao Ishihara (Representative of EUV-FEL Light Source Study Group for Industrialization)
Openning Remarks
- Prof. Sunao Ishihara (Representative of EUV-FEL Light Source Study Group for Industrialization)
13:00 - 13:10
13:10 Greeting - Dr. Tetsuyuki Muramatsu (MEXT)
Greeting
- Dr. Tetsuyuki Muramatsu (MEXT)
13:10 - 13:15
13:15 Target of the workshop - Prof. Hiroshi Kawata (KEK (Secretary of the workshop))
Target of the workshop
- Prof. Hiroshi Kawata (KEK (Secretary of the workshop))
13:15 - 13:25
13:25 The Future of Semiconductor Manufacturing: New Developments in Speed and Innovation. - Dr. Kazunari Ishimaru (Rapidus Corporation)
The Future of Semiconductor Manufacturing: New Developments in Speed and Innovation.
- Dr. Kazunari Ishimaru (Rapidus Corporation)
13:25 - 14:05
14:05 The Last Light Source - Dr. Erik R. Hosler (xLight, Inc.)
The Last Light Source
- Dr. Erik R. Hosler (xLight, Inc.)
14:05 - 14:35
14:35 Overview of accelerator element development in KEK for realization of EUV-FEL - Prof. Shinichiro Michizono (Accelerator Laboratory, KEK)
Overview of accelerator element development in KEK for realization of EUV-FEL
- Prof. Shinichiro Michizono (Accelerator Laboratory, KEK)
14:35 - 15:05
15:05 Break
Break
15:05 - 15:20
15:20 The importance of and methods for coherence reduction in accelerator based lithography systems - Dr. Patrick P. Naulleau (EUV Tech Inc., Lawrence Berkeley National Laboratory )
The importance of and methods for coherence reduction in accelerator based lithography systems
- Dr. Patrick P. Naulleau (EUV Tech Inc., Lawrence Berkeley National Laboratory )
15:20 - 15:50
15:50 The current status and difficulties in manufacturing multilayer mirrors for BEUV lithography - Dr. Hisataka Takenaka (TOYAMA Co., Ltd.)
The current status and difficulties in manufacturing multilayer mirrors for BEUV lithography
- Dr. Hisataka Takenaka (TOYAMA Co., Ltd.)
15:50 - 16:20
16:20 Plasma Dynamics and Future of LPP-EUV Source for Semiconductor Manufacturing - Prof. Hakaru Mizoguchi et al. (Quantum and Photonics Technology Research Center, Kyushu University)
Plasma Dynamics and Future of LPP-EUV Source for Semiconductor Manufacturing
- Prof. Hakaru Mizoguchi et al. (Quantum and Photonics Technology Research Center, Kyushu University)
16:20 - 16:50
16:50 Closing address - Koki Uchimaru (KEK, Executive Director)
Closing address
- Koki Uchimaru (KEK, Executive Director)
16:50 - 16:55
16:55 Photo-session
Photo-session
16:55 - 17:00