Name: 8th EUV-FEL Workshop
Start: 2024-01-29T13:00:00+09:00
End: 2024-01-29T21:00:00+09:00
Location: No location set

8th EUV-FEL Workshop

Monday, January 29, 2024 - 1:00 PM

Monday, January 29, 2024
1:00 PM Openning Remarks - Prof. Sunao Ishihara (Representative of EUV-FEL Light Source Study Group for Industrialization)
Openning Remarks
- Prof. Sunao Ishihara (Representative of EUV-FEL Light Source Study Group for Industrialization)
1:00 PM - 1:10 PM
1:10 PM Greeting - Dr. Tetsuyuki Muramatsu (MEXT)
Greeting
- Dr. Tetsuyuki Muramatsu (MEXT)
1:10 PM - 1:15 PM
1:15 PM Target of the workshop - Prof. Hiroshi Kawata (KEK (Secretary of the workshop))
Target of the workshop
- Prof. Hiroshi Kawata (KEK (Secretary of the workshop))
1:15 PM - 1:25 PM
1:25 PM The Future of Semiconductor Manufacturing: New Developments in Speed and Innovation. - Dr. Kazunari Ishimaru (Rapidus Corporation)
The Future of Semiconductor Manufacturing: New Developments in Speed and Innovation.
- Dr. Kazunari Ishimaru (Rapidus Corporation)
1:25 PM - 2:05 PM
2:05 PM The Last Light Source - Dr. Erik R. Hosler (xLight, Inc.)
The Last Light Source
- Dr. Erik R. Hosler (xLight, Inc.)
2:05 PM - 2:35 PM
2:35 PM Overview of accelerator element development in KEK for realization of EUV-FEL - Prof. Shinichiro Michizono (Accelerator Laboratory, KEK)
Overview of accelerator element development in KEK for realization of EUV-FEL
- Prof. Shinichiro Michizono (Accelerator Laboratory, KEK)
2:35 PM - 3:05 PM
3:05 PM Break
Break
3:05 PM - 3:20 PM
3:20 PM The importance of and methods for coherence reduction in accelerator based lithography systems - Dr. Patrick P. Naulleau (EUV Tech Inc., Lawrence Berkeley National Laboratory )
The importance of and methods for coherence reduction in accelerator based lithography systems
- Dr. Patrick P. Naulleau (EUV Tech Inc., Lawrence Berkeley National Laboratory )
3:20 PM - 3:50 PM
3:50 PM The current status and difficulties in manufacturing multilayer mirrors for BEUV lithography - Dr. Hisataka Takenaka (TOYAMA Co., Ltd.)
The current status and difficulties in manufacturing multilayer mirrors for BEUV lithography
- Dr. Hisataka Takenaka (TOYAMA Co., Ltd.)
3:50 PM - 4:20 PM
4:20 PM Plasma Dynamics and Future of LPP-EUV Source for Semiconductor Manufacturing - Prof. Hakaru Mizoguchi et al. (Quantum and Photonics Technology Research Center, Kyushu University)
Plasma Dynamics and Future of LPP-EUV Source for Semiconductor Manufacturing
- Prof. Hakaru Mizoguchi et al. (Quantum and Photonics Technology Research Center, Kyushu University)
4:20 PM - 4:50 PM
4:50 PM Closing address - Koki Uchimaru (KEK, Executive Director)
Closing address
- Koki Uchimaru (KEK, Executive Director)
4:50 PM - 4:55 PM
4:55 PM Photo-session
Photo-session
4:55 PM - 5:00 PM