8th EUV-FEL Workshop

Asia/Tokyo
〒101-0021 4-14-1 Sotokanda, Chiyoda-ku, Tokyo Akihabara UDX 4F
Description

Utilization of IoT, AI and related technologies, information processing devices and systems are evolving towards an ultra-smart society. To this end, EUV exposure technology has been introduced to the forefront of semiconductor chip production.

If we scope the future of EUV lithography technologies such as high NA EUV lithography exposure system, it is important to increase the EUV light source power to reduce the stochastic effect, and to achieve polarized light in order to ensure optimal contrast for high NA exposure system.  Additionally, a wavelength tunable EUV light source, a crucial element for realizing Beyond EUVL, is essential in the long term. In this regard, the EUV-FEL light source emerges as one of the most promising candidates.

We are delighted to report recent developments, including the commencement of the construction of an advanced semiconductor chip fabrication facility by the Japanese company Rapidus Corporation, as well as the establishment of xLight, Inc. in the USA, dedicated to the development of an accelerator-based light source for lithography.

The workshop will be held at the afternoon of January 29, 2024, and will be conducted in English as an international gathering. The event will take place at two locations: NEXT-1/UDX in Tokyo and the Zoom platform virtually.

Dr. Kazunari Ishimaru, representing Rapidus Corporation, will deliver a keynote lecture on the "The Future of Semiconductor Manufacturing: New Developments in Speed and Innovation. " Additionally, we are honored to feature distinguished invited speakers, including Dr. Erik R. Hosler, CEO of xLight, Inc., Prof. Shinichiro Michizono from KEK, Dr. Patrick P. Naulleau, CEO of EUV Tech Inc., Dr. Hisataka Takenaka from TOYAMA Co., Ltd., and Prof. Hakaru Mizoguchi from Kyushu University, who will present their respective invited talks. 

We hope that you will participate and discuss on high-power EUV light sources for the future at this meeting. 

 



Sunao Ishihara
Representative of EUV-FEL Light Source Study Group for Industrialization

Hiroshi Kawata
High Energy Accelerator Research Organization, Innovation Center for Applied Superconducting Accelerator (iCASA)

 


This workshop is supported by funding based on "KEK Donation Programs".

Registration
Registration Form
Participants
  • Akira Yoshida
  • Akiyoshi Suzuki
  • Atsushi Ueguri
  • Chao Chang
  • Chiaki Sato
  • Christoph Quitmann
  • Cong Que DINH
  • DAISUKE BIZEN
  • Daniel Brown
  • Dongxiao Fan
  • Duan Gu
  • Eiichi Nomura
  • EIICHI TANAKA
  • Eiji Kako
  • Gennady Stupakov
  • HIDEAKI FUTAGAMI
  • Hideki Yamamoto
  • Hidenori Watanabe
  • Hideo Aoki
  • Hikari Tomori
  • Hiroaki Ammo
  • Hirofumi Nishi
  • Hiromichi Fujii
  • Hiromu Arisaka
  • Hiroshi Hara
  • Hiroshi KAWATA
  • Hiroshi Sakai
  • Hiroyoshi Kubo
  • HIROYUKI ISOBE
  • Hisataka Takenaka
  • Hisatsune Watanabe
  • Hitomi KUSAMA
  • Hitoshi Hayano
  • Howard Johnson
  • Ichiro Mori
  • Imei Cho
  • Jang-Hui Han
  • Jos Benschop
  • Junichi Seki
  • Junji Iwasa
  • Kanji Sugino
  • kaoru taketani
  • Katsuhiko Murakami
  • Katsumasa Ikematsu
  • Katsumi Endo
  • Katsunobu Nishihara
  • Katsuya Hirota
  • Kayoko Cho
  • Kazuaki Suzuki
  • kazuki Yoshikawa
  • Kazunori Seki
  • Kazuyuki Suko
  • Keisuke Fugane
  • Kenji Endo
  • Kimichika Tsuchiya
  • kiyohiko Nohara
  • kobayashi daigo
  • Kohei Yoshimoto
  • Kohji Abe
  • Koji Kasuga
  • Kosuke Sato
  • Kouji Kuramoto
  • Kunihiko Kasama
  • Kyoichi Suwa
  • Maekawa Hiroyuki
  • Masaharu Nishikino
  • Masahiro Aoyagi
  • Masahiro Katoh
  • Masahiro Seyama
  • Masakazu Washio
  • Masaki Yamabe
  • Masanobu Ezaki
  • MASANOBU FUJISAWA
  • Masanori Matsuoka
  • Masashi Degawa
  • Masashi Tanaka
  • Masato Shibuya
  • Masatoshi Hatayama
  • Masatsugu Kamiura
  • Mikio Kadoi
  • Mitsunori Toyoda
  • Morihisa Hoga
  • Motoo Koyama
  • Nao HIGASHI
  • Naoshi BABA
  • Naoya Hayashi
  • nobumichi fuchigami
  • Nobuyuki Shigeoka
  • Norihito Fukugami
  • Norihito Kuno
  • Norio Nakamura
  • Omez Mesina
  • Osamu Yushiro
  • Ryo Takebe
  • Ryukou Kato
  • S KATO
  • Satomi Takahashi
  • Satoshi ICHIMARU
  • Satoshi Suitoh
  • SEIICHI TAGAWA
  • shibuya takashi
  • Shingo Watanabe
  • SHINGO YOSHIKAWA
  • Shinji Matsui
  • Shinji Okazaki
  • Shinji Yamaguchi
  • shinya ishii
  • Shinya Koshihara
  • Shoji Hotta
  • Shuhei Sato
  • Shuji Miyamoto
  • Shunsuke Nozawa
  • Shusuke Yoshitake
  • Sojeong Lee
  • Stanley Gu
  • Sunao Ishihara
  • Tadashi Koseki
  • Takaaki Watanabe
  • Takahiro Machida
  • Takanori Tanikawa
  • Takayuki Uchiyama
  • Takeo Matsuki
  • Takeshi Higashiguchi
  • TAKUYA KONO
  • Tastuo Chijimatsu
  • Tetsushi Hara
  • Thanh Hung DINH
  • Tomohiro Yamada
  • TORU FUJIMORI
  • Toshiji Suzuki
  • Toshio Konishi
  • Toshiro Itani
  • Toshiyuki Horiuchi
  • Toyohiro Chikyow
  • TSUKASA ABE
  • Tsutomu Shoki
  • XIAOBAO SONG
  • xiaolong wang
  • xijie wang
  • Yasuko Saito
  • YASUO ARAI
  • YASUO SASAKI
  • yoichi minami
  • Yoshio Suzuki
  • Yuichiro Kawabata
  • Yuichiro Oguchi
  • Yuji Sano
  • Yuji Tanaka
  • Yuma Onishi
  • Yutaka Nabeshima
  • Yutaka Nagasawa
  • YUTAKA NAKAGAWA
  • Zenggong Jiang
  • 真一 小川
    • 13:00 13:10
      Openning Remarks 10m
      Speaker: Prof. Sunao Ishihara (Representative of EUV-FEL Light Source Study Group for Industrialization)
    • 13:10 13:15
      Greeting 5m
      Speaker: Dr. Tetsuyuki Muramatsu (MEXT)
    • 13:15 13:25
      Target of the workshop 10m
      Speaker: Prof. Hiroshi Kawata (KEK (Secretary of the workshop))
    • 13:25 14:05
      The Future of Semiconductor Manufacturing: New Developments in Speed and Innovation. 40m
      Speaker: Dr. Kazunari Ishimaru (Rapidus Corporation)
    • 14:05 14:35
      The Last Light Source 30m
      Speaker: Dr. Erik R. Hosler (xLight, Inc.)
    • 14:35 15:05
      Overview of accelerator element development in KEK for realization of EUV-FEL 30m
      Speaker: Prof. Shinichiro Michizono (Accelerator Laboratory, KEK)
    • 15:05 15:20
      Break 15m
    • 15:20 15:50
      The importance of and methods for coherence reduction in accelerator based lithography systems 30m
      Speaker: Dr. Patrick P. Naulleau (EUV Tech Inc., LBNL )
    • 15:50 16:20
      The current status and difficulties in manufacturing multilayer mirrors for BEUV lithography 30m
      Speaker: Dr. Hisataka Takenaka (TOYAMA Co., Ltd.)
    • 16:20 16:50
      Plasma Dynamics and Future of LPP-EUV Source for Semiconductor Manufacturing 30m
      Speaker: Prof. Hakaru Mizoguchi et al. (Quantum and Photonics Technology Research Center, Kyushu University)
    • 16:50 16:55
      Closing address 5m
      Speaker: Prof. Shin-ichi Adachi (KEK)
    • 16:55 17:00
      Photo-session 5m