8th EUV-FEL Workshop

Monday 29 Jan 2024, 13:00 → 17:00 Asia/Tokyo

Utilization of IoT, AI and related technologies, information processing devices and systems are evolving towards an ultra-smart society. To this end, EUV exposure technology has been introduced to the forefront of semiconductor chip production.

If we scope the future of EUV lithography technologies such as high NA EUV lithography exposure system, it is important to increase the EUV light source power to reduce the stochastic effect, and to achieve polarized light in order to ensure optimal contrast for high NA exposure system.  Additionally, a wavelength tunable EUV light source, a crucial element for realizing Beyond EUVL, is essential in the long term. In this regard, the EUV-FEL light source emerges as one of the most promising candidates.

We are delighted to report recent developments, including the commencement of the construction of an advanced semiconductor chip fabrication facility by the Japanese company Rapidus Corporation, as well as the establishment of xLight, Inc. in the USA, dedicated to the development of an accelerator-based light source for lithography.

The workshop will be held at the afternoon of January 29, 2024, and will be conducted in English as an international gathering. The event will take place at two locations: NEXT-1/UDX in Tokyo and the Zoom platform virtually.

Dr. Kazunari Ishimaru, representing Rapidus Corporation, will deliver a keynote lecture on the "The Future of Semiconductor Manufacturing: New Developments in Speed and Innovation. " Additionally, we are honored to feature distinguished invited speakers, including Dr. Erik R. Hosler, CEO of xLight, Inc., Prof. Shinichiro Michizono from KEK, Dr. Patrick P. Naulleau, CEO of EUV Tech Inc., Dr. Hisataka Takenaka from TOYAMA Co., Ltd., and Prof. Hakaru Mizoguchi from Kyushu University, who will present their respective invited talks. 

We hope that you will participate and discuss on high-power EUV light sources for the future at this meeting. 
 

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Sunao Ishihara
Representative of EUV-FEL Light Source Study Group for Industrialization

Hiroshi Kawata
High Energy Accelerator Research Organization, Innovation Center for Applied Superconducting Accelerator (iCASA)
 

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This workshop is supported by funding based on "KEK Donation Programs".

Poster.pdf

Program.pdf

13:00 → 13:10 Openning Remarks

Speaker: Prof. Sunao Ishihara (Representative of EUV-FEL Light Source Study Group for Industrialization)

13:10 → 13:15 Greeting

Speaker: Dr. Tetsuyuki Muramatsu (MEXT)

13:15 → 13:25 Target of the workshop

Speaker: Prof. Hiroshi Kawata (KEK (Secretary of the workshop))

13:25 → 14:05 The Future of Semiconductor Manufacturing: New Developments in Speed and Innovation.

Speaker: Dr. Kazunari Ishimaru (Rapidus Corporation)

14:05 → 14:35 The Last Light Source

Speaker: Dr. Erik R. Hosler (xLight, Inc.)

14:35 → 15:05 Overview of accelerator element development in KEK for realization of EUV-FEL

Speaker: Prof. Shinichiro Michizono (Accelerator Laboratory, KEK)

15:05 → 15:20 Break

15:20 → 15:50 The importance of and methods for coherence reduction in accelerator based lithography systems

Speaker: Dr. Patrick P. Naulleau (EUV Tech Inc., LBNL )

15:50 → 16:20 The current status and difficulties in manufacturing multilayer mirrors for BEUV lithography

Speaker: Dr. Hisataka Takenaka (TOYAMA Co., Ltd.)

16:20 → 16:50 Plasma Dynamics and Future of LPP-EUV Source for Semiconductor Manufacturing

Speaker: Prof. Hakaru Mizoguchi et al. (Quantum and Photonics Technology Research Center, Kyushu University)

16:50 → 16:55 Closing address

Speaker: Prof. Shin-ichi Adachi (KEK)

16:55 → 17:00 Photo-session