29 January 2024
Asia/Tokyo timezone
Announcement of the 8th EUV-FEL Workshop!

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13:00
14:00
15:00
16:00
17:00
Prof. Sunao Ishihara (Representative of EUV-FEL Light Source Study Group for Industrialization)
Openning Remarks
13:00 - 13:10
Dr. Tetsuyuki Muramatsu (MEXT)
Greeting
13:10 - 13:15
Prof. Hiroshi Kawata (KEK (Secretary of the workshop))
Target of the workshop
13:15 - 13:25
Dr. Kazunari Ishimaru (Rapidus Corporation)
The Future of Semiconductor Manufacturing: New Developments in Speed and Innovation.
13:25 - 14:05
Dr. Erik R. Hosler (xLight, Inc.)
The Last Light Source
14:05 - 14:35
Prof. Shinichiro Michizono (Accelerator Laboratory, KEK)
Overview of accelerator element development in KEK for realization of EUV-FEL
14:35 - 15:05
Break
15:05 - 15:20
Dr. Patrick P. Naulleau (EUV Tech Inc., Lawrence Berkeley National Laboratory )
The importance of and methods for coherence reduction in accelerator based lithography systems
15:20 - 15:50
Dr. Hisataka Takenaka (TOYAMA Co., Ltd.)
The current status and difficulties in manufacturing multilayer mirrors for BEUV lithography
15:50 - 16:20
Prof. Hakaru Mizoguchi et al. (Quantum and Photonics Technology Research Center, Kyushu University)
Plasma Dynamics and Future of LPP-EUV Source for Semiconductor Manufacturing
16:20 - 16:50
Koki Uchimaru (KEK, Executive Director)
Closing address
16:50 - 16:55
Photo-session
16:55 - 17:00