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8th EUV-FEL Workshop

29 January 2024
Asia/Tokyo timezone
Announcement of the 8th EUV-FEL Workshop!

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Contribution List

12 out of 12 displayed
  1. 1. Openning Remarks
    Prof. Sunao Ishihara (Representative of EUV-FEL Light Source Study Group for Industrialization)
    29/01/2024, 13:00
  2. 2. Greeting
    Dr. Tetsuyuki Muramatsu (MEXT)
    29/01/2024, 13:10
  3. 3. Target of the workshop
    Prof. Hiroshi Kawata (KEK (Secretary of the workshop))
    29/01/2024, 13:15
  4. 4. The Future of Semiconductor Manufacturing: New Developments in Speed and Innovation.
    Dr. Kazunari Ishimaru (Rapidus Corporation)
    29/01/2024, 13:25
  5. 5. The Last Light Source
    Dr. Erik R. Hosler (xLight, Inc.)
    29/01/2024, 14:05
  6. 6. Overview of accelerator element development in KEK for realization of EUV-FEL
    Prof. Shinichiro Michizono (Accelerator Laboratory, KEK)
    29/01/2024, 14:35
  7. 7. The importance of and methods for coherence reduction in accelerator based lithography systems
    Dr. Patrick P. Naulleau (EUV Tech Inc., Lawrence Berkeley National Laboratory )
    29/01/2024, 15:20
  8. 8. The current status and difficulties in manufacturing multilayer mirrors for BEUV lithography
    Dr. Hisataka Takenaka (TOYAMA Co., Ltd.)
    29/01/2024, 15:50
  9. 9. Plasma Dynamics and Future of LPP-EUV Source for Semiconductor Manufacturing
    Prof. Hakaru Mizoguchi et al. (Quantum and Photonics Technology Research Center, Kyushu University)
    29/01/2024, 16:20
  10. 10. Closing address
    Koki Uchimaru (KEK, Executive Director)
    29/01/2024, 16:50
  11. 11. Photo-session
    29/01/2024, 16:55
  12. 12. Test