8th EUV-FEL Workshop

Contribution List

1. Openning Remarks

Prof. Sunao Ishihara (Representative of EUV-FEL Light Source Study Group for Industrialization)

1/29/24, 1:00 PM

2. Greeting

Dr. Tetsuyuki Muramatsu (MEXT)

1/29/24, 1:10 PM

3. Target of the workshop

Prof. Hiroshi Kawata (KEK (Secretary of the workshop))

1/29/24, 1:15 PM

4. The Future of Semiconductor Manufacturing: New Developments in Speed and Innovation.

Dr. Kazunari Ishimaru (Rapidus Corporation)

1/29/24, 1:25 PM

5. The Last Light Source

Dr. Erik R. Hosler (xLight, Inc.)

1/29/24, 2:05 PM

6. Overview of accelerator element development in KEK for realization of EUV-FEL

Prof. Shinichiro Michizono (Accelerator Laboratory, KEK)

1/29/24, 2:35 PM

7. The importance of and methods for coherence reduction in accelerator based lithography systems

Dr. Patrick P. Naulleau (EUV Tech Inc., Lawrence Berkeley National Laboratory )

1/29/24, 3:20 PM

8. The current status and difficulties in manufacturing multilayer mirrors for BEUV lithography

Dr. Hisataka Takenaka (TOYAMA Co., Ltd.)

1/29/24, 3:50 PM

9. Plasma Dynamics and Future of LPP-EUV Source for Semiconductor Manufacturing

Prof. Hakaru Mizoguchi et al. (Quantum and Photonics Technology Research Center, Kyushu University)

1/29/24, 4:20 PM

10. Closing address

Koki Uchimaru (KEK, Executive Director)

1/29/24, 4:50 PM

11. Photo-session

1/29/24, 4:55 PM

12. Test