8th EUV-FEL Workshop

Monday, 29 January 2024 - 13:00


        : Sessions
    /     : Talks
        : Breaks
29 Jan 2024
AM
PM
13:00 Openning Remarks - Prof. Sunao Ishihara (Representative of EUV-FEL Light Source Study Group for Industrialization)   ()
13:10 Greeting - Dr. Tetsuyuki Muramatsu (MEXT)   ()
13:15 Target of the workshop - Prof. Hiroshi Kawata (KEK (Secretary of the workshop))   ()
13:25 The Future of Semiconductor Manufacturing: New Developments in Speed and Innovation. - Dr. Kazunari Ishimaru (Rapidus Corporation)   ()
14:05 The Last Light Source - Dr. Erik R. Hosler (xLight, Inc.)   ()
14:35 Overview of accelerator element development in KEK for realization of EUV-FEL - Prof. Shinichiro Michizono (Accelerator Laboratory, KEK)   ()
15:05 --- Break ---
15:20 The importance of and methods for coherence reduction in accelerator based lithography systems - Dr. Patrick P. Naulleau (EUV Tech Inc., LBNL )   ()
15:50 The current status and difficulties in manufacturing multilayer mirrors for BEUV lithography - Dr. Hisataka Takenaka (TOYAMA Co., Ltd.)   ()
16:20 Plasma Dynamics and Future of LPP-EUV Source for Semiconductor Manufacturing - Prof. Hakaru Mizoguchi et al. (Quantum and Photonics Technology Research Center, Kyushu University)   ()
16:50 Closing address - Prof. Shin-ichi Adachi (KEK)   ()
16:55 Photo-session   ()