8th EUV-FEL Workshop

Contribution List

1. Openning Remarks

Prof. Sunao Ishihara (Representative of EUV-FEL Light Source Study Group for Industrialization)

29/01/2024, 13:00

2. Greeting

Dr. Tetsuyuki Muramatsu (MEXT)

29/01/2024, 13:10

3. Target of the workshop

Prof. Hiroshi Kawata (KEK (Secretary of the workshop))

29/01/2024, 13:15

4. The Future of Semiconductor Manufacturing: New Developments in Speed and Innovation.

Dr. Kazunari Ishimaru (Rapidus Corporation)

29/01/2024, 13:25

5. The Last Light Source

Dr. Erik R. Hosler (xLight, Inc.)

29/01/2024, 14:05

6. Overview of accelerator element development in KEK for realization of EUV-FEL

Prof. Shinichiro Michizono (Accelerator Laboratory, KEK)

29/01/2024, 14:35

7. The importance of and methods for coherence reduction in accelerator based lithography systems

Dr. Patrick P. Naulleau (EUV Tech Inc., Lawrence Berkeley National Laboratory )

29/01/2024, 15:20

8. The current status and difficulties in manufacturing multilayer mirrors for BEUV lithography

Dr. Hisataka Takenaka (TOYAMA Co., Ltd.)

29/01/2024, 15:50

9. Plasma Dynamics and Future of LPP-EUV Source for Semiconductor Manufacturing

Prof. Hakaru Mizoguchi et al. (Quantum and Photonics Technology Research Center, Kyushu University)

29/01/2024, 16:20

10. Closing address

Koki Uchimaru (KEK, Executive Director)

29/01/2024, 16:50

11. Photo-session

29/01/2024, 16:55

12. Test